高純AZO靶材-粉體-磁控濺射真空鍍膜材料-4~6N可定制
價(jià)格
訂貨量(根)
¥40000.00
≥10
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安徽省合肥市
AZO靶材 AZO Target
產(chǎn)品說(shuō)明Product description
AZO靶材是鋅鋁氧化物功能陶瓷材料,主要應(yīng)用于磁控濺射制備AZO透明導(dǎo)電薄膜。采用粉末冶金,燒結(jié)工藝,多個(gè)靶管拼接貼合為AZO靶材成品。
AZO target is a functional zinc aluminum oxide ceramic material, which is used for deposition of AZO transparent conductive thin films with magnetron sputtering. It is produced by suing power metallurgy and sintering process, in the form of tube/planar segments that are bonded into AZO target.
AZO旋轉(zhuǎn)靶/平面靶 Rotary/ Planar AZO target
組分Chemical composition (wt%) | Al2O3:ZnO = 2:98 |
純度 Purity (%) | ≥99.95 |
密度 Density (g/cm3) | ≥5.56 |
相對(duì)密度 Relative density (%) | ≥99.3 |
綁定貼合率 Adhering ratio (%) | ≥98 % |
靶材尺寸 Dimension
-靶材外徑(Target outer diameter)?151-160 mm
-鋼管直徑(Stainless steel tube diameters) OD 133 mm/ID 125 mm
-長(zhǎng)度(Length)≤4 m
-按圖紙要求加工(According to customized drawings)
應(yīng)用領(lǐng)域Applications
-薄膜太陽(yáng)能電池Thin film solar cells
-Low-E鍍膜玻璃Low-E glasses
-汽車鍍膜玻璃Automotive glasses
產(chǎn)品特點(diǎn)Product features
-密度高,成膜質(zhì)量好。
High-density target leading to high quality films
-使用功率高,為13 kM/m。
Sputtering power of as high as 13 kW/m.
-濺射速率、使用效率比同類產(chǎn)品高。
Sputtering rate and utilization efficiency that are high than the products of competito rs